0481686

Specifications

Coating material

Silicon dioxide

Purity

99.99%

Form

Granulate

Dimensions

1.5 – 5.0 mm

Quantity

5 kg

Theoretical density at 20°C

2.2 g/cm3

Melting point

1720 °C

Temperature at vapor pressure

10-2 mbar

2000 °C

10-1 mbar

2200 °C

Boiling point

2230 °C

Specific evaporation conditions

Reactive gas pressure

Possible

Substrate temperature range

< 100 °C

Good

100 - 200 °C

Good

200 - 300 °C

Good

Film transparency

Low

< 0.2 µm

High

9 µm

Film refractive index n / extinction coefficient k

at 550nm

n

1.45-1.48

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