A large number of deposition techniques are used for the production of thin films for optical applications — the two most important categories are physical vapor deposition (PVD), namely thermal vaporization and sputtering, and chemical vapor deposition (CVD). It is obvious, that for each deposition technique suitable coating materials are required.
Indium Tin Oxide (ITO)
An article discussing two electro-optic applications that have shown tremendous growth over the last few years: flat panel displays and solar cells.
Indium Tin Oxide Sputtering Targets, ITO Sputter Targets
ITO Targets or Indium Tin Oxide sputtering targets are manufactured by Umicore with the highest of quality standards.
Sputtering Targets (Sputter Target)
Umicore sputtering targets (sputter targets) are manufactured with the highest of quality standards. Our target size and microstructure are designed to serve the latest 300 mm wafer technology.
Evaporation Materials and Coating Materials
Umicore manufactures evaporation and coating materials for physical vapor deposition (PVD) and has more than 50 years experience in this field.